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Back to the USB-C studies

StackUp 3D / USB-C contact study

Give every
contact room.

A connector can fit on the outside while the space between its contacts still needs attention. Follow one selected gap, see what consumes its clearance, and test a more focused positioning requirement.

44 seconds / Silent film with on-screen explanations

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The result

One positioning change.
40 µm more clearance.

The adverse and refined cases use identical maximum contact widths. Reducing the opposing position shifts increases the selected physical gap from 152.5 to 192.5 µm.

01 / Nominal geometry275 µm

Selected nominal widths and aligned contact centers.

02 / Adverse position152.5 µm

Maximum contact widths; opposing 40 µm shifts per contact.

03 / Refined position192.5 µm

The same maximum widths; opposing 20 µm shifts per contact.

The example target is 175 µm minimum clearance, chosen for this study. All three gaps remain positive; the adverse case is 22.5 µm below that target, and the refined case is 17.5 µm above it.

Adverse and refined USB-C contact positions compared at the same maximum widths, with 152.5 and 192.5 micrometres of clearance and 40 micrometres recovered.
Same maximum widths. A more focused positioning requirement.View full image

01 / Define the relationship

From the cable
to the contact array.

The selected measurement runs from plug contact P_A6 to neighboring receptacle contact R_A7. The exploded view reveals both arrays; the analysis uses a defined inspection pose with aligned datum frames.

A USB-C cable and portable drive with shells and covers separated to clearly expose both gold contact arrays.
Product context / Covers moved aside to reveal the contactsView full image

02 / Review the evidence

See the geometry.
Check the gap.

These are actual StackUp 3D captures of the evaluated geometric states. Native point-distance results agree with independent CAD distance checks for the selected contact envelopes.

Actual StackUp 3D view of the adverse contact geometry, with a native proximity field and selected clearance of 152.5 micrometres.
Adverse position / 152.5 µm selected clearanceView full image
Actual StackUp 3D view of the refined contact geometry, with a native proximity field and selected clearance of 192.5 micrometres.
Refined position / 192.5 µm selected clearanceView full image
Measurement and presentation notes

This is an illustrative geometric study of selected contact envelopes, with aligned datum frames and the remaining pose fixed. The 175 µm target and tighter positioning requirement are authored study choices, rather than USB-C certification limits. Electrical behavior, contact force and process yield are outside its scope.

The macro renders enlarge geometry 3× along X to make the gap visible; the displayed measurements retain physical units. Native application views use physical geometry. Software field legends are in millimetres and use a different palette from the rendered views.

Native distance labels round to 0.001 mm. A displayed zero sigma describes the imposed geometric state, not zero manufacturing variation. Software inserts are held captures, and dissolves between evaluated fields are editorial transitions.

Find the relationship that matters

What controls the gap
in your assembly?

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